Keywords

LDMOS, power conversion, buck converter, InGaAs

Abstract

In this work an n-channel In0.65Ga0.35As LDMOS with Al2O3 as gate dielectric is investigated. Instead of using traditional Si process for LDMOS, we suggest In0.65Ga0.35As as substitute material due to its higher electron mobility and its promising for power applications. The proposed 0.5-µm channel-length LDMOS cell is studied through device TCAD simulation tools. Due to different gate dielectric, comprehensive comparisons between In0.65Ga0.35As LDMOS and Si LDMOS are made in two ways, structure with the same cross-sectional dimension, and structure with different thickness of gate dielectric to achieve the same gate capacitance. The on-resistance of the new device shows a big improvement with no degradation on breakdown voltage over traditional device. Also it is indicated from these comparisons that the figure of merit(FOM) Ron·Qg of In0.65Ga0.35As LDMOS shows an average of 91.9% improvement to that of Si LDMOS. To further explore the benefit of using In0.65Ga0.35As LDMOS as switch in power applications, DC-DC buck converter is utilized to observe the performance of LDMOS in terms of power efficiency. The LDMOS performance is experimented with operation frequency of the circuit sweeping in the range from 100 KHz to 100 MHz. It turns out InGaAs LDMOS is good candidate for power applications.

Notes

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Graduation Date

2009

Advisor

Yuan, Jiann-Shiun

Degree

Master of Science in Electrical Engineering (M.S.E.E.)

College

College of Engineering and Computer Science

Department

Electrical Engineering and Computer Science

Degree Program

Electrical Engineering

Format

application/pdf

Identifier

CFE0002686

URL

http://purl.fcla.edu/fcla/etd/CFE0002686

Language

English

Release Date

September 2009

Length of Campus-only Access

None

Access Status

Masters Thesis (Open Access)

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