Keywords

Imaging system, vuv, plasma

Abstract

High-power debris-free vacuum ultraviolet (VUV) light sources have applications in several scientific and engineering areas, such as high volume manufacturing lithography and inspection tools in the semiconductor industry, as well as other applications in material processing and photochemistry. For the past decades, the semiconductor industry has been driven by what is called "Moore's Law". The entire semiconductor industry relies on this rule, which requires chip makers to pack transistors more tightly with every new generation of chips, shrinking the size of transistors. The ability to solve roadmap challenges is, at least partly, proportional to our ability to measure them. The focus of this thesis is on imaging transient VUV laser plasma sources with specialized reflective imaging optics for metrology applications. The plasma dynamics in novel laser-based Zinc and Tin plasma sources will be discussed. The Schwarzschild optical system was installed to investigate the time evolution of the plasma size in the VUV region at wavelengths of 172 nm and 194 nm. The outcomes are valuable for interpreting the dynamics of low-temperature plasma and to optimize laser-based VUV light sources.

Notes

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Graduation Date

2014

Semester

Summer

Advisor

Richardson, Martin

Degree

Master of Science (M.S.)

College

College of Optics and Photonics

Department

Optics and Photonics

Degree Program

Optics and Photonics

Format

application/pdf

Identifier

CFE0005352

URL

http://purl.fcla.edu/fcla/etd/CFE0005352

Language

English

Release Date

August 2014

Length of Campus-only Access

None

Access Status

Masters Thesis (Open Access)

Subjects

Dissertations, Academic -- Optics and Photonics; Optics and Photonics -- Dissertations, Academic

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