Title

Laser Chemical Vapor Deposition Of Thin Films

Title - Alternative

Mater. Sci. Eng. B-Solid State Mater. Adv. Technol.

Keywords

Laser Chemical Vapor Deposition; Thin Films; Damkohler Number; Finite Slabs; Cvd; Tin; Materials Science, Multidisciplinary; Physics, Condensed Matter

Abstract

Laser chemical vapor deposition (LCVD) is a technique to deposit thin film of oxidation, corrosion, and wear resistant materials as well as electronic, optoelectronic, and superconductor materials. The shape and morphology, which affect the properties of such films, depend on the laser parameters and the processing conditions. This paper presents a mathematical model to predict the shape of the deposits. Also, this model allows to select the appropriate process parameters to obtain a good quality film. The Damkohler number is shown to influence the morphology of the film. Also, an optimum condition is found to exist for depositing thin film by using the LCVD technique. Copyright (C) 1996 Elsevier Science S.A.

Publication Title

Materials Science and Engineering B-Solid State Materials for Advanced Technology

Volume

41

Issue/Number

3

Publication Date

1-1-1996

Document Type

Article

Language

English

First Page

368

Last Page

373

WOS Identifier

WOS:A1996WA87500013

ISSN

0921-5107

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