Title

Comparative-Study Of Titanium-Dioxide Thin-Films Produced By Electron-Beam Evaporation And By Reactive Low-Voltage Ion Plating

Title - Alternative

Appl. Optics

Keywords

Tio2 Thin Films; Optical Constants; Electron-Beam Evaporation; Ion; Plating; Thin Films; Optics

Abstract

Titanium dioxide (TiO2) is often used as a high refractive-index material for multilayer optical coatings. However, the optical properties of TiO2 films depend strongly on the deposition process and its parameters. A comparative study of TiO2 films fabricated by conventional electron-beam evaporation and by reactive low-voltage ion plating that uses different phases of Ti-O as starting materials is reported. Results on the variability of TiO2 thin films are analyzed in relation to process parameters. The potential of fabricating high and low refractive-index multilayer stacks with TiO2 only, by employing two different deposition processes, is presented with a practical example.

Publication Title

Applied Optics

Volume

32

Issue/Number

28

Publication Date

1-1-1993

Document Type

Article

Language

English

First Page

5594

Last Page

5600

WOS Identifier

WOS:A1993LZ49700025

ISSN

0003-6935

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