Comparative-Study Of Titanium-Dioxide Thin-Films Produced By Electron-Beam Evaporation And By Reactive Low-Voltage Ion Plating
Title - Alternative
Tio2 Thin Films; Optical Constants; Electron-Beam Evaporation; Ion; Plating; Thin Films; Optics
Titanium dioxide (TiO2) is often used as a high refractive-index material for multilayer optical coatings. However, the optical properties of TiO2 films depend strongly on the deposition process and its parameters. A comparative study of TiO2 films fabricated by conventional electron-beam evaporation and by reactive low-voltage ion plating that uses different phases of Ti-O as starting materials is reported. Results on the variability of TiO2 thin films are analyzed in relation to process parameters. The potential of fabricating high and low refractive-index multilayer stacks with TiO2 only, by employing two different deposition processes, is presented with a practical example.
Balasubramanian, K.; Han, X. F.; and Guenther, K. H., "Comparative-Study Of Titanium-Dioxide Thin-Films Produced By Electron-Beam Evaporation And By Reactive Low-Voltage Ion Plating" (1993). Faculty Bibliography. 1817.