Title

Optical Wave-Guide Characterization Of Dielectric Films Deposited By Reactive Low-Voltage Ion Plating

Title - Alternative

Appl. Optics

Keywords

Refractive-Index Profiles; Wave-Guides; Embossing Technique; Thin-Films; Microstructure; Coatings; Coupler; Optics

Abstract

We determine the quality of single films of various oxides, which are deposited on thermally oxidized silicon wafers by reactive low-voltage ion plating (RLVIP), by measuring their optical waveguide losses. We use a prism coupler for inserting the radiation of a wavelength-selectable He-Ne laser into the waveguide and a CCD camera for imaging the light scattered from the surface of the films. The waveguide losses of the RLVIP films are typically of the order of 1 to 10 dB/cm. Some data obtained for TiO2 layers on thermally grown SiO2 and RLVIP SiO2 seem to confirm the presence of an absorbing boundary layer between RLVIP SiO2 and TiO2 that has been found in SiO2-TiO2 multilayers. The waveguide measurements also reveal unusual index gradients in thick (approximately 10 mum) single layers Of Al2O3 derived from multimode effective index calculations.

Publication Title

Applied Optics

Volume

32

Issue/Number

28

Publication Date

1-1-1993

Document Type

Article

Language

English

First Page

5640

Last Page

5644

WOS Identifier

WOS:A1993LZ49700031

ISSN

0003-6935

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