Title

Soft X-Ray Projection Lithography Using a 1-1 Ring Field Optical-System

Keywords

Thin-films; constants; 1216-A; 24-A; Engineering, Electrical & Electronic; Nanoscience & Nanotechnology; Physics, Applied

Abstract

An iridium-coated Offner 1:1 ring field camera has been used to carry out projection lithography using 42 nm light from an undulator in the vacuum ultra violet storage ring at Brookhaven National Laboratory. Near-diffraction-limited resolution has been obtained showing features as small as 0.2-mu-m within a 2 mm x 0.25 mm image field. Images of both transmission and reflection masks have been obtained. The impact of source coherence on imagery has been investigated. Hydrocarbon contamination problems experienced in this photon energy range have been investigated and possible solutions are suggested.

Publication Title

Journal of Vacuum Science & Technology B

Volume

9

Issue/Number

6

Publication Date

1-1-1991

Document Type

Article; Proceedings Paper

Language

English

First Page

3193

Last Page

3197

WOS Identifier

WOS:A1991GW42300090

ISSN

1071-1023

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