Soft X-Ray Projection Lithography Using a 1-1 Ring Field Optical-System
Thin-films; constants; 1216-A; 24-A; Engineering, Electrical & Electronic; Nanoscience & Nanotechnology; Physics, Applied
An iridium-coated Offner 1:1 ring field camera has been used to carry out projection lithography using 42 nm light from an undulator in the vacuum ultra violet storage ring at Brookhaven National Laboratory. Near-diffraction-limited resolution has been obtained showing features as small as 0.2-mu-m within a 2 mm x 0.25 mm image field. Images of both transmission and reflection masks have been obtained. The impact of source coherence on imagery has been investigated. Hydrocarbon contamination problems experienced in this photon energy range have been investigated and possible solutions are suggested.
Journal of Vacuum Science & Technology B
Article; Proceedings Paper
MacDowell, A. A.; Bjorkholm, J. E.; Bokor, J.; Eichner, L.; Freeman, R. R.; Mansfield, W. M.; Pastalan, J.; Szeto, L. H.; Tennant, D. M.; Wood, O. R.; Jewell, T. E.; Waskiewicz, W. K.; White, D. L.; Windt, D. L.; Silfvast, W. T.; and Zernike, F., "Soft X-Ray Projection Lithography Using a 1-1 Ring Field Optical-System" (1991). Faculty Bibliography. 2111.