Title
Laser Chemical Vapor Deposition Of Thin Films
Abbreviated Journal Title
Mater. Sci. Eng. B-Solid State Mater. Adv. Technol.
Keywords
Laser Chemical Vapor Deposition; Thin Films; Damkohler Number; Finite Slabs; Cvd; Tin; Materials Science, Multidisciplinary; Physics, Condensed Matter
Abstract
Laser chemical vapor deposition (LCVD) is a technique to deposit thin film of oxidation, corrosion, and wear resistant materials as well as electronic, optoelectronic, and superconductor materials. The shape and morphology, which affect the properties of such films, depend on the laser parameters and the processing conditions. This paper presents a mathematical model to predict the shape of the deposits. Also, this model allows to select the appropriate process parameters to obtain a good quality film. The Damkohler number is shown to influence the morphology of the film. Also, an optimum condition is found to exist for depositing thin film by using the LCVD technique. Copyright (C) 1996 Elsevier Science S.A.
Journal Title
Materials Science and Engineering B-Solid State Materials for Advanced Technology
Volume
41
Issue/Number
3
Publication Date
1-1-1996
Document Type
Article
Language
English
First Page
368
Last Page
373
WOS Identifier
ISSN
0921-5107
Recommended Citation
"Laser Chemical Vapor Deposition Of Thin Films" (1996). Faculty Bibliography 1990s. 788.
https://stars.library.ucf.edu/facultybib1990/788
Comments
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