Title

Direct electron beam writing of electro-optic polymer microring resonators

Authors

Authors

H. S. Sun; A. T. Chen; B. C. Olbricht; J. A. Davies; P. A. Sullivan; Y. Liao;L. R. Dalton

Comments

Authors: contact us about adding a copy of your work at STARS@ucf.edu

Abbreviated Journal Title

Opt. Express

Keywords

WAVE-GUIDES; OPTICAL MODULATION; FABRICATION; EMISSION; Optics

Abstract

Electro-optic polymer waveguides in electron beam sensitive polymethyl methacrylate (PMMA) polymer matrix doped with organic nonlinear chromophores could be directly patterned by electron beam exposure with high resolution and smoothness. The polymer in the exposed regions was removed with standard electron beam resist developer and without damaging the chromophore containing polymer waveguides. Feature sizes on the order of 100 nm could be clearly resolved. High quality microring resonators made of YL124/PMMA electro-optic polymer were successfully fabricated with this technique. The measured resonance extinction ratios were more than 16 dB and quality factors were in the range of 10(3)similar to 10(4). (C) 2008 Optical Society of America.

Journal Title

Optics Express

Volume

16

Issue/Number

9

Publication Date

1-1-2008

Document Type

Article

Language

English

First Page

6592

Last Page

6599

WOS Identifier

WOS:000255663000067

ISSN

1094-4087

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