Oxidation and chemical state analysis of polycrystalline magnetron sputtered (Ti,Al)N films at ambient and liquid N-2 temperatures
Abbreviated Journal Title
J. Vac. Sci. Technol. A-Vac. Surf. Films
X-RAY PHOTOELECTRON; THIN-FILMS; STAINLESS-STEEL; OXIDE; ALUMINUM; COATINGS; SURFACE; TI; SPECTROSCOPY; CHEMISTRY; Materials Science, Coatings & Films; Physics, Applied
In order to improve the functional properties of hard coatings, recent investigations have been directed towards Ti-N based multicomponent materials. The nitride (Ti, Al)N, in particular, with a Ti:Al ratio of 1:1 seems to be a promising alternative to the widely used TiN, exhibits better oxidation resistance and hence improved performance over that of TiN. (Ti, Al)N coatings were de sputter deposited onto 316SS substrates under ambient and liquid nitrogen temperatures. As deposited films were oxidized in a vertical fused-silica tube furnace in pure O-2 flowing atmosphere at temperatures ranging from 700 to 900 degrees C. Scanning electron microscope and atomic force microscope images reveal information about the particle size and film thickness. X-ray photoelectron spectroscopy was employed to study the chemistry of the cop few atomic layers in addition to compositional analysis and information on the details of chemical bonding, The difference in film stoichiometry are compared at two different deposition conditions thus reflecting their behavior under oxidizing conditions. (C) 2000 American Vacuum Society. [S0734-2101(00)06203-7].
Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films
Article; Proceedings Paper
"Oxidation and chemical state analysis of polycrystalline magnetron sputtered (Ti,Al)N films at ambient and liquid N-2 temperatures" (2000). Faculty Bibliography 2000s. 2794.