Dynamics of mass-limited laser plasma targets as sources for extreme ultraviolet lithography
Abbreviated Journal Title
Jpn. J. Appl. Phys. Part 1 - Regul. Pap. Short Notes Rev. Pap.
laser plasma; EUV lithography; water droplet target; X-RAY-LITHOGRAPHY; EUV; Physics, Applied
The droplet laser plasma source has many attractive features as a continuous, almost debris-free source for extreme ultraviolet (EUV) and X-ray radiation applications. In a combined experimental and theoretical study, we are analyzing the interaction physics between the laser light and microscopic spherical liquid droplet targets over a range of conditions.
Japanese Journal of Applied Physics Part 1-Regular Papers Short Notes & Review Papers
Article; Proceedings Paper
"Dynamics of mass-limited laser plasma targets as sources for extreme ultraviolet lithography" (2002). Faculty Bibliography 2000s. 3285.