Title
Aberration measurement of photolithographic lenses by use of hybrid diffractive photomasks
Abbreviated Journal Title
Appl. Optics
Keywords
Optics
Abstract
In optical lithography the degradation of imagequality due to aberrations present in the exposure tool is a serious problem. Therefore it is desirable to establish a reliable aberration measurement procedure based on the analysis of printed images in the photoresist. We present what is to our knowledge a new method for characterizing the aberrations of an exposure tool using a hybrid diffractive photomask. By utilizing each different impact on the aberrated image from each diffracted illumination, we were able to extract the aberration present in the stepper system. We experimentally verified this method with a G-line stepper and verified its spherical aberration astigmatism. (C) 2003 Optical Society of America.
Journal Title
Applied Optics
Volume
42
Issue/Number
11
Publication Date
1-1-2003
Document Type
Article
Language
English
First Page
1987
Last Page
1995
WOS Identifier
ISSN
1559-128X
Recommended Citation
"Aberration measurement of photolithographic lenses by use of hybrid diffractive photomasks" (2003). Faculty Bibliography 2000s. 4057.
https://stars.library.ucf.edu/facultybib2000/4057