Abbreviated Journal Title
Opt. Express
Keywords
EXTREME-ULTRAVIOLET EMISSION; PLASMA SOURCE; PULSE AMPLIFICATION; GENERATION; AMPLIFIERS; Optics
Abstract
In this paper we report the development of nanosecond-pulsed fiber laser technology for the next generation EUV lithography sources. The demonstrated fiber laser system incorporates large core fibers and arbitrary optical waveform generation, which enables achieving optimum intensities and other critical beam characteristics on a laser-plasma target. Experiment demonstrates efficient EUV generation with conversion efficiency of up to 2.07% for in-band 13.5-nm radiation using mass-limited Sn-doped droplet targets. This result opens a new technological path towards fiber laser based high power EUV sources for high-throughput lithography steppers.
Journal Title
Optics Express
Volume
16
Issue/Number
2
Publication Date
1-1-2008
Document Type
Article
Language
English
First Page
965
Last Page
974
WOS Identifier
ISSN
1094-4087
Recommended Citation
Hou, Kai-Chung; George, Simi; Mordovanakis, Aghapi G.; Takenoshita, Kazutoshi; Nees, John; Lafontaine, Bruno; Richardson, Martin; and Galvanauskas, Almantas, "High power fiber laser driver for efficient EUV lithography source with tin-doped water droplet targets" (2008). Faculty Bibliography 2000s. 457.
https://stars.library.ucf.edu/facultybib2000/457
Comments
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