Title

High power fiber laser driver for efficient EUV lithography source with tin-doped water droplet targets

Authors

Authors

K. C. Hou; S. George; A. G. Mordovanakis; K. Takenoshita; J. Nees; B. Lafontaine; M. Richardson;A. Galvanauskas

Comments

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Abbreviated Journal Title

Opt. Express

Keywords

EXTREME-ULTRAVIOLET EMISSION; PLASMA SOURCE; PULSE AMPLIFICATION; GENERATION; AMPLIFIERS; Optics

Abstract

In this paper we report the development of nanosecond-pulsed fiber laser technology for the next generation EUV lithography sources. The demonstrated fiber laser system incorporates large core fibers and arbitrary optical waveform generation, which enables achieving optimum intensities and other critical beam characteristics on a laser-plasma target. Experiment demonstrates efficient EUV generation with conversion efficiency of up to 2.07% for in-band 13.5-nm radiation using mass-limited Sn-doped droplet targets. This result opens a new technological path towards fiber laser based high power EUV sources for high-throughput lithography steppers. (c) 2007 Optical Society of America.

Journal Title

Optics Express

Volume

16

Issue/Number

2

Publication Date

1-1-2008

Document Type

Article

Language

English

First Page

965

Last Page

974

WOS Identifier

WOS:000252479700048

ISSN

1094-4087

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