Investigations on hardness of rf sputter deposited SiCN thin films
Abbreviated Journal Title
Mater. Sci. Eng. A-Struct. Mater. Prop. Microstruct. Process.
amorphous materials; sputtering; XPS; silicon carbide; CHEMICAL-VAPOR-DEPOSITION; CARBON NITRIDE FILMS; MECHANICAL-PROPERTIES; NITROGENATED CARBON; COATINGS; INDENTATION; BETA-SI3N4; RESONANCE; HYDROGEN; SOLIDS; Nanoscience & Nanotechnology; Materials Science, Multidisciplinary; Metallurgy & Metallurgical Engineering
Thin films of amorphous silicon carbide nitride (a-SiCxNy) were deposited in a rf magnetron sputtering system using a SiC target. Films with various compositions were deposited on to silicon substrate by changing the N-2/Ar gas ratios during sputtering. Nano-indentation studies were performed to investigate the mechanical properties of the SiCN films. Surface morphology of the films was characterized by using Atomic Force Microscope. X-ray Photoelectron Spectroscopy (XPS) data indicated that the chemical status is highly sensitive to the nitrogen ratios during sputtering. (C) 2003 Elsevier B.V. All rights reserved.
Materials Science and Engineering a-Structural Materials Properties Microstructure and Processing
"Investigations on hardness of rf sputter deposited SiCN thin films" (2004). Faculty Bibliography 2000s. 4821.