Abbreviated Journal Title
Opt. Express
Keywords
COUPLED-WAVE ANALYSIS; 4 NONCOPLANAR BEAMS; HOLOGRAPHIC LITHOGRAPHY; PHOTONIC CRYSTALS; IMPLEMENTATION; INTERFERENCE; FABRICATION; GRATINGS; Optics
Abstract
Near-field nano-patterning greatly simplifies holographic lithography, but deformations in formed structures are potentially severe. A fast and efficient comprehensive model was developed to predict geometry more rigorously. Numerical results show simple intensity-threshold methods do not accurately predict shape or optical behavior. By modeling sources with partial coherence, unpolarized light, and an angular spectrum, it is shown that standard UV lamps can be used to form 3D structures.
Journal Title
Optics Express
Volume
13
Issue/Number
18
Publication Date
1-1-2005
Document Type
Article
Language
English
First Page
7198
Last Page
7208
WOS Identifier
ISSN
1094-4087
Recommended Citation
Rumpf, Raymond C. and Johnson, Eric G., "Comprehensive modeling of near-field nano-patterning" (2005). Faculty Bibliography 2000s. 5621.
https://stars.library.ucf.edu/facultybib2000/5621
Comments
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