Title

Comprehensive modeling of near-field nano-patterning

Authors

Authors

R. C. Rumpf;E. G. Johnson

Comments

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Abbreviated Journal Title

Opt. Express

Keywords

COUPLED-WAVE ANALYSIS; 4 NONCOPLANAR BEAMS; HOLOGRAPHIC LITHOGRAPHY; PHOTONIC CRYSTALS; IMPLEMENTATION; INTERFERENCE; FABRICATION; GRATINGS; Optics

Abstract

Near-field nano-patterning greatly simplifies holographic lithography, but deformations in formed structures are potentially severe. A fast and efficient comprehensive model was developed to predict geometry more rigorously. Numerical results show simple intensity-threshold methods do not accurately predict shape or optical behavior. By modeling sources with partial coherence, unpolarized light, and an angular spectrum, it is shown that standard UV lamps can be used to form 3D structures. (c) 2005 Optical Society of America

Journal Title

Optics Express

Volume

13

Issue/Number

18

Publication Date

1-1-2005

Document Type

Article

Language

English

First Page

7198

Last Page

7208

WOS Identifier

WOS:000231719600059

ISSN

1094-4087

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