Title

Ion channeling effects on the focused ion beam milling of Cu

Authors

Authors

B. W. Kempshall; S. M. Schwarz; B. I. Prenitzer; L. A. Giannuzzi; R. B. Irwin;F. A. Stevie

Comments

Authors: contact us about adding a copy of your work at STARS@ucf.edu

Abbreviated Journal Title

J. Vac. Sci. Technol. B

Keywords

Engineering, Electrical & Electronic; Nanoscience & Nanotechnology; Physics, Applied

Abstract

The use of focused ion beam (FIB) instruments for device modification and specimen preparation has become a mainstay in the microelectronics industry and in thin film characterization. The role of the FIB as a tool to rapidly prepare high quality transmission electron microscopy specimens is particularly significant. Special attention has been given to FIB milling of Cu and Si in the microelectronics arena. Although FIB applications involving Si have been extremely successful, it has been noted that Cu tends to present significant challenges to FIB milling because of effects such as the development of milling induced topographical features. We show evidence that links the occurrence of milling induced topography to the severity of redeposition. Specifically, Cu, which sputters similar to2.5 times faster than Si, exhibits an increased susceptibility to redeposition related artifacts. In addition, the effects and the mechanism of Ga+ channeling in Cu is used to illustrate that Ga+ channeling reduces the sputtering yield, improves the quality of FIB mill cuts, and improves the surface characteristics of FIB milled Cu. Finally, a technique for improving FIB milling across grain boundaries or interfaces using ion channeling contrast is Suggested. (C) 2001 American Vacuum Society.

Journal Title

Journal of Vacuum Science & Technology B

Volume

19

Issue/Number

3

Publication Date

1-1-2001

Document Type

Article

Language

English

First Page

749

Last Page

754

WOS Identifier

WOS:000169366600024

ISSN

1071-1023

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