Title

Xenon capillary discharge extreme-ultraviolet source emitting over a large angular range

Authors

Authors

M. A. Klosner;W. T. Silfvast

Comments

Authors: contact us about adding a copy of your work at STARS@ucf.edu

Abbreviated Journal Title

Appl. Optics

Keywords

RAY PROJECTION LITHOGRAPHY; REGION; Optics

Abstract

We describe a capillary discharge source configuration, allowing for collection of extreme-ultraviolet (EUV) radiation at large off-axis angles, without the need for an EUV window. Operating with xenon gas, the source emits intensely within the EUV spectral region at 11.3 and 13.5 nm. When coupled with a high-collection-efficiency optical system, this source may be suitable for a number of high-average-power EUV imaging applications. (C) 2001 Optical Society of America.

Journal Title

Applied Optics

Volume

40

Issue/Number

27

Publication Date

1-1-2001

Document Type

Article

DOI Link

http://dx.doi.org/10.1364/ao.40.004849

Language

English

First Page

4849

Last Page

4851

WOS Identifier

WOS:000171028400010

ISSN

1559-128X

Recommended Citation

"Xenon capillary discharge extreme-ultraviolet source emitting over a large angular range" (2001). Faculty Bibliography 2000s. 8071.
https://stars.library.ucf.edu/facultybib2000/8071