Title

Surface Modification of Carbon Post Arrays by Atomic Layer Deposition of ZnO Film

Authors

Authors

H. A. Lee; Y. C. Byun; U. Singh; H. J. Cho;H. Kim

Comments

Authors: contact us about adding a copy of your work at STARS@ucf.edu

Abbreviated Journal Title

J. Nanosci. Nanotechnol.

Keywords

Carbon Microelectromechanical System; Atomic Layer Deposition; Zinc; Oxide; Pyrolysis; MEMS; Chemistry, Multidisciplinary; Nanoscience & Nanotechnology; Materials; Science, Multidisciplinary; Physics, Applied; Physics, Condensed Matter

Abstract

The applicability of atomic layer deposition (ALD) process to the carbon microelectromechanical system technology was studied for a surface modification method of the carbon post electrodes. A conformal coating of the ALD-ZnO film was successfully demonstrated on the carbon post arrays which were fabricated by the traditional photolithography and subsequent two-step pyrolysis. A significant Zn diffusion into the underlying carbon posts was observed during the ALD process. The addition of a sputter-deposited ZnO interfacial layer efficiently blocked the Zn diffusion without altering the microstructure and surface morphology of the ALD-ZnO film.

Journal Title

Journal of Nanoscience and Nanotechnology

Volume

11

Issue/Number

8

Publication Date

1-1-2011

Document Type

Article; Proceedings Paper

DOI Link

http://dx.doi.org/10.1166/jnn.2011.4827

Language

English

First Page

7322

Last Page

7326

WOS Identifier

WOS:000295296400126

ISSN

1533-4880

Recommended Citation

"Surface Modification of Carbon Post Arrays by Atomic Layer Deposition of ZnO Film" (2011). Faculty Bibliography 2010s. 1526.
https://stars.library.ucf.edu/facultybib2010/1526