Morphologies from slippery ballistic deposition model: A bottom-up approach for nanofabrication
Abbreviated Journal Title
Phys. Rev. E
GROWTH; INTERFACES; Physics, Fluids & Plasmas; Physics, Mathematical
We report pattern formation using a slippery ballistic deposition (SBD) model where growth germinates from a single site or from sites distributed periodically on a lattice. By changing the sticking probability p(s) and choosing systems with different lattice constants and symmetries, we demonstrate that a variety of patterns can be generated. These patterns can be further used as scaffolds for nanofabrication. We also demonstrate that by choosing a lateral sticking probability p(l) at the base that is different than p(s), one can control both the early and late time morphologies originating from a seed. Furthermore, we indicate a possible generalization of preparing patterns to higher dimensions that in principle can have potential technological applications for preparing grooves and scaffolds of specific shapes and periodicities.
Physical Review E
"Morphologies from slippery ballistic deposition model: A bottom-up approach for nanofabrication" (2011). Faculty Bibliography 2010s. 1825.