Authors

S. Toroghi;P. G. Kik

Comments

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"This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in the linked citation and may be found originally at Applied Physics Letters."

Abbreviated Journal Title

Appl. Phys. Lett.

Keywords

antennas; electron beam lithography; nanofabrication; nanolithography; plasmons; soft lithography; NANOPARTICLES; Physics, Applied

Abstract

Cascaded field enhancement is demonstrated in asymmetric plasmon resonant dimer nanoantennas consisting of shape-tuned ellipsoidal nanoparticles. The nanoparticles that make up the dimer have identical thickness, suggesting that the presented approach can be used to design cascaded dimer antennas compatible with standard two-dimensional top-down nanofabrication tools such as electron beam lithography and nano-imprint lithography. Cascaded excitation is achieved by modification of the in-plane particle aspect ratios in a way that keeps the resonance frequency of the individual particles fixed while significantly changing their polarizability. The achievable field enhancement is evaluated as a function of the particle volume ratio and spacing.

Journal Title

Applied Physics Letters

Volume

101

Issue/Number

1

Publication Date

1-1-2012

Document Type

Article

Language

English

First Page

4

WOS Identifier

WOS:000306144800071

ISSN

0003-6951

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