Title

Femtosecond laser nanomachining initiated by ultraviolet multiphoton ionization

Authors

Authors

X. M. Yu; Q. M. Bian; Z. H. Chang; P. B. Corkum;S. T. Lei

Comments

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Abbreviated Journal Title

Opt. Express

Keywords

DIELECTRICS; BREAKDOWN; ABLATION; DYNAMICS; Optics

Abstract

We report on the experimental results of 300 nm features generated on fused silica using a near-infrared (IR) femtosecond laser pulse initiated by an ultraviolet (UV) pulse. With both pulses at a short (similar to 60 fs) delay, the damage threshold of the UV pulse is only 10% of its normal value. Considerable reduction of UV damage threshold is observed when two pulses are at +/- 1.3 ps delay. The damage feature size of the combined pulses is similar to that of a single UV pulse. A modified rate equation model with the consideration of defect states is used to help explain these results. This concept can be applied to shorter wavelengths, e.g. XUV and X-ray, with the required fluence below their normal threshold. (C)2013 Optical Society of America

Journal Title

Optics Express

Volume

21

Issue/Number

20

Publication Date

1-1-2013

Document Type

Article

Language

English

First Page

24185

Last Page

24190

WOS Identifier

WOS:000325549800113

ISSN

1094-4087

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