Low-loss, submicron chalcogenide integrated photonics with chlorine plasma etching
Abbreviated Journal Title
Appl. Phys. Lett.
GE-SB-S; WAVE-GUIDES; STRUCTURAL-PROPERTIES; FABRICATION; GLASSES; FILMS; Physics, Applied
A chlorine plasma etching-based method for the fabrication of high-performance chalcogenide-based integrated photonics on silicon substrates is presented. By optimizing the etching conditions, chlorine plasma is employed to produce extremely low-roughness etched sidewalls on waveguides with minimal penalty to propagation loss. Using this fabrication method, microring resonators with record-high intrinsic Q-factors as high as 450 000 and a corresponding propagation loss as low as 0.42 dB/cm are demonstrated in submicron chalcogenide waveguides. Furthermore, the developed chlorine plasma etching process is utilized to demonstrate fiber-to-waveguide grating couplers in chalcogenide photonics with high power coupling efficiency of 37% for transverse-electric polarized modes. (C) 2015 AIP Publishing LLC.
Applied Physics Letters
"Low-loss, submicron chalcogenide integrated photonics with chlorine plasma etching" (2015). Faculty Bibliography 2010s. 6468.