Title

Low-loss, submicron chalcogenide integrated photonics with chlorine plasma etching

Authors

Authors

J. Chiles; M. Malinowski; A. Rao; S. Novak; K. Richardson;S. Fathpour

Comments

Authors: contact us about adding a copy of your work at STARS@ucf.edu

Abbreviated Journal Title

Appl. Phys. Lett.

Keywords

GE-SB-S; WAVE-GUIDES; STRUCTURAL-PROPERTIES; FABRICATION; GLASSES; FILMS; Physics, Applied

Abstract

A chlorine plasma etching-based method for the fabrication of high-performance chalcogenide-based integrated photonics on silicon substrates is presented. By optimizing the etching conditions, chlorine plasma is employed to produce extremely low-roughness etched sidewalls on waveguides with minimal penalty to propagation loss. Using this fabrication method, microring resonators with record-high intrinsic Q-factors as high as 450 000 and a corresponding propagation loss as low as 0.42 dB/cm are demonstrated in submicron chalcogenide waveguides. Furthermore, the developed chlorine plasma etching process is utilized to demonstrate fiber-to-waveguide grating couplers in chalcogenide photonics with high power coupling efficiency of 37% for transverse-electric polarized modes. (C) 2015 AIP Publishing LLC.

Journal Title

Applied Physics Letters

Volume

106

Issue/Number

11

Publication Date

1-1-2015

Document Type

Article

Language

English

First Page

4

WOS Identifier

WOS:000351595500010

ISSN

0003-6951

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