Capillary discharge extreme ultraviolet lamp sources for EUV microlithography and other applications. The invention covers operating conditions for a pulsed capillary discharge lamp for EUVL and other applications such as resist exposure tools, microscopy, interferometry, metrology, biology and pathology. Techniques and processes are described to mitigate against capillary bore erosion, pressure pulse generation, and debris formation in capillary discharge-powered lamps operating in the EUV. Additional materials are described for constructing capillary discharge devices fore EUVL and related applications. Further, lamp designs and configurations are described for lamps using gasses and metal vapors as the radiating species.
Application Serial Number
Agency: Extreme Ultraviolet (EUV), LLC
Assignee at Issuance
College of Optics and Photonics
Assignee at Filing
Nonprovisional Application Record
Silfvast, William and Klosner, Marc, "Discharge Lamp Sources Apparatus and Methods" (2001). UCF Patents. 125.