Title

Discharge Lamp Sources Apparatus and Methods. (CA)

Abstract

Capillary discharge extreme ultraviolet lamp sources for EUV microlithography and other applications. The invention covers operating conditions for a pulsed capillary discharge lamp for EUVL and other applications such as resist exposure tools, microscopy, interferometry, metrology, biology and pathology. Techniques and processes are described to mitigate against capillary bore erosion, pressure pulse generation, and debris formation in capillary discharge-powered lamps operating in the EUV. Additional materials are described for constructing capillary discharge devices fore EUVL and related applications. Further, lamp designs and configurations are described for lamps using gasses and metal vapors as the radiating species.

Document Type

Patent

Patent Number

CA 2 315 740

Application Serial Number

2315740

Issue Date

7-20-2004

Current Assignee

Agency: Extreme Ultraviolet (EUV), LLC

Assignee at Issuance

Agency: Extreme Ultraviolet (EUV), LLC

College

College of Optics and Photonics

Department

CREOL

Filing Date

12-28-1998

Assignee at Filing

Agency: Extreme Ultraviolet (EUV), LLC

Filing Type

National Filing Record

Donated

no

Link to Patent

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