Abstract

An EUV radiation source that creates a stable solid target filament. The source includes a nozzle assembly having a condenser chamber for cryogenically cooling a gaseous target material into a liquid state. The liquid target material is forced through an orifice of a target filament generator into an evaporation chamber as a liquid target stream. The evaporation chamber has a higher pressure than a vacuum process chamber of the source to allow the liquid target material to freeze into a target filament in a stable manner. The frozen target filament is emitted from the evaporation chamber into a process chamber as a stable target filament towards a target area. The higher pressure in the evaporation chamber can be the result of the evaporative cooling of the target material alone or in combination with a supplemental gas.

Document Type

Patent

Patent Number

US 6,864,497

Application Serial Number

10/317,402

Issue Date

3-8-2005

Current Assignee

Joint Assignment w/UCFRF

Assignee at Issuance

UCFRF

Filing Date

12-11-2002

Assignee at Filing

Agency: TRW Inc.

Filing Type

Nonprovisional Application Record

Donated

yes

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