An EUV radiation source that creates a stable solid target filament. The source includes a nozzle assembly having a condenser chamber for cryogenically cooling a gaseous target material into a liquid state. The liquid target material is forced through an orifice of a target filament generator into an evaporation chamber as a liquid target stream. The evaporation chamber has a higher pressure than a vacuum process chamber of the source to allow the liquid target material to freeze into a target filament in a stable manner. The frozen target filament is emitted from the evaporation chamber into a process chamber as a stable target filament towards a target area. The higher pressure in the evaporation chamber can be the result of the evaporative cooling of the target material alone or in combination with a supplemental gas.
Application Serial Number
Joint Assignment w/UCFRF
Assignee at Issuance
Assignee at Filing
Agency: TRW Inc.
Nonprovisional Application Record
McGregor, Roy; Orsini, Rocco; and Petach, Michael, "Droplet and Filament Target Stabilizer for EUV Source Nozzles" (2005). UCF Patents. 133.