Title

Droplet Target Delivery Method for High Pulse Rate Laser Plasma Extreme Ultraviolet Light Source (EU)

Abstract

A laser-plasma, EUV radiation source that controls the target droplet delivery rate so that successive target droplets are not affected by the ionization of a preceding target droplet. A source nozzle of the source has an orifice of a predetermined size that allow the droplets to be emitted at a rate set by the target materials natural Rayleigh instability break-up frequency as generated by a piezoelectric transducer. The rate of the droplet generation is determined by these factors in connection with the pulse frequency of the excitation laser so that buffer droplets are delivered between the target droplets. The buffer droplets act to absorb radiation generated from the ionized target droplet so that the next target droplet is not affected.

Document Type

Patent

Patent Number

EP 1 367 866 B1

Application Serial Number

3011055.5

Issue Date

1-3-2007

Current Assignee

UCFRF

Assignee at Issuance

UCFRF

Filing Date

5-20-2003

Assignee at Filing

Agency

Filing Type

Foreign Filing Record

Donated

yes

Link to Patent
PDF on Google Patents

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