Abstract

Methods for making pulsed and continuous discharge plasma light sources for extreme ultraviolet(EUV) projection lithography and soft-x-ray microscopy as well as other applications are disclosed. A first light source of doubly ionized lithium ions emits over a narrow bandwidth of approximately 13.5 nm. A second light source of beryllium ions radiates at approximately 7.60 nm. A third light source of boron ions radiates at approximately 4.86 nm, and a fourth light source of carbon ions radiates at approximately 3.38 nm. Preferred embodiments of apparatus for generating pulsed and continuous discharge sources are disclosed.

Document Type

Patent

Patent Number

US 5,499,282

Application Serial Number

08/237,018

Issue Date

3-12-1996

Current Assignee

Agency: Extreme Ultraviolet (EUV), LLC

Assignee at Issuance

UCFRF

College

College of Optics and Photonics

Department

CREOL

Filing Date

5-2-1994

Assignee at Filing

UCFRF

Filing Type

Nonprovisional Application Record

Donated

no

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