Methods for making pulsed and continuous discharge plasma light sources for extreme ultraviolet(EUV) projection lithography and soft-x-ray microscopy as well as other applications are disclosed. A first light source of doubly ionized lithium ions emits over a narrow bandwidth of approximately 13.5 nm. A second light source of beryllium ions radiates at approximately 7.60 nm. A third light source of boron ions radiates at approximately 4.86 nm, and a fourth light source of carbon ions radiates at approximately 3.38 nm. Preferred embodiments of apparatus for generating pulsed and continuous discharge sources are disclosed.
Application Serial Number
Agency: Extreme Ultraviolet (EUV), LLC
Assignee at Issuance
College of Optics and Photonics
Assignee at Filing
Nonprovisional Application Record
Silfvast, William, "Efficient Narrow Spectral Width Soft X-Ray Discharge Sources" (1996). UCF Patents. 139.