A laser-plasma EUV radiation source that employs one or more approaches for preventing vaporization of material from a nozzle assembly of the source by electrical discharge from the plasma. The first approach includes employing an electrically isolating nozzle end, such as a glass capillary tube. The tube extends beyond all of the conductive surfaces of the nozzle assembly by a suitable distance so that the pressure around the closet conducting portion of the nozzle assembly is low enough not to support arcing. A second approach includes providing electrical isolation of the conductive portions of the source from the vacuum chamber wall. A third approach includes applying a bias potential to the nozzle assembly to raise the potential of the nozzle assembly to the potential of the arc.
Application Serial Number
Joint Assignment w/UCFRF
Assignee at Issuance
Assignee at Filing
Agency: TRW Inc.
Nonprovisional Application Record
Fornaca, Steven; McGregor, Roy; Orsini, Rocco; and Shields, Henry, "Erosion Reduction for EUV laser Produced Plasma Target Sources" (2005). UCF Patents. 157.