Abstract
Metallic solutions at room temperature used a laser point source target droplets. Using the target metallic solutions results in damage free use to surrounding optical components since no debris are formed. The metallic solutions can produce plasma emissions in the X-rays, XUV, and EUV (extreme ultra violet) spectral ranges of approximately 11.7 nm and 13 nm. The metallic solutions can include molecular liquids or mixtures of elemental and molecular liquids, such as metallic chloride solutions, metallic bromide solutions, metallic sulphate solutions, metallic nitrate solutions, and organo-metallic solutions. The metallic solutions do not need to be heated since they are in a solution form at room temperatures.
Document Type
Patent
Patent Number
US 6,831,963
Application Serial Number
09/881,620
Issue Date
12-14-2004
Current Assignee
UCFRF
Assignee at Issuance
UCFRF
College
College of Optics and Photonics
Department
CREOL
Allowance Date
12-15-2003
Filing Date
6-14-2001
Assignee at Filing
UCFRF
Filing Type
Nonprovisional Application Record
Donated
no
Recommended Citation
Richardson, Martin, "EUV, XUV, and X-RAY Wavelength Sources Created From Laser Plasma Produced From Liquid Metal Solutions" (2004). UCF Patents. 160.
https://stars.library.ucf.edu/patents/160