Title
High Output Extreme Ultraviolet Source
Abstract
An EUV source that delivers a laser beam asymmetrical relative to first collection optics. The first collection optics has an opening for the laser beam that is positioned so that the laser beam is directed towards the plasma off-axis relative to the collection optics. Thus, the strongest EUV radiation is not blocked by the target production hardware.
Document Type
Patent
Patent Number
EP 1 255 163 B1
Application Serial Number
02009577.4-2208CH
Issue Date
7-20-2005
Current Assignee
UCFRF
Assignee at Issuance
UCFRF
Allowance Date
9-22-2004
Filing Date
4-26-2002
Assignee at Filing
Agency: TRW Inc.
Filing Type
Foreign Filing Record
Donated
yes
Recommended Citation
Orsini, Rocco, "High Output Extreme Ultraviolet Source" (2005). UCF Patents. 236.
https://stars.library.ucf.edu/patents/236
COinS