An EUV radiation source that includes a nozzle positioned a far enough distance away from a target region so that EUV radiation generated at the target region by a laser beam impinging a target stream emitted from the nozzle is not significantly absorbed by target vapor proximate the nozzle. Also, the EUV radiation does not significantly erode the nozzle and contaminate source optics. In one embodiment, the nozzle is more than 10 cm away from the target region.
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Agency: Northrop Grumman Corporation
Nonprovisional Application Record
Fornaca, Steven; Hartlove, Jeffrey; Martos, Armando; McNaught, Stuart; Michaelian, Mark; and Shields, Henry, "Laser-produced plasma EUV light source with isolated plasma" (2005). UCF Patents. 291.