An EUV radiation source that creates a stable solid filament target. The source includes nozzle assembly having a condenser chamber for cryogenically cooling a gaseous target material into a liquid state. The liquid target material is filtered by a filter and sent to a holding chamber under pressure. The holding chamber allows entrained gas bubbles in the target being emitted from the nozzle assembly. The target material is forced through a nozzle outlet tube to be emitted from the nozzle assembly as a liquid target stream. A thermal shield is provided around the outlet tube to maintain the liquid target material in the cryogenic state. The liquid target stream freezes and is vaporized by a laser beam from a laser source to generate the EUV radiation.
Application Serial Number
Joint Assignment w/UCFRF
Assignee at Issuance
Assignee at Filing
Agency: TRW Inc.
Nonprovisional Application Record
Fornaca, Steven; McGregor, Roy; Michaelian, Mark; Orsini, Rocco; Petach, Michael; and Shields, Henry, "Low Vapor Pressure, Low Debris Solid Target for EUV Production." (2004). UCF Patents. 308.