Semiconductor light emitting and sensing devices are comprised of a lattice matching wurtzite structure oxide substrate and a III-V nitride compound semiconductor single crystal film epitaxially grown on the substrate. Single crystals of these oxides are grown and the substrates are produced. The lattice matching substrates include Lithium Aluminum Oxide (LiAlO.sub.2), Lithium Gallium Oxide (LiGaO.sub.2), Lithium Silicon Oxide (Li.sub.2 SiO.sub.3), Lithium Germanium Oxide (Li.sub.2 GeO.sub.3), Sodium Aluminum Oxide (NaAlO.sub.2), Sodium Gallium Oxide (NaGaO.sub.2), Sodium Germanium Oxide (Na.sub.2 GeO.sub.3), Sodium Silicon Oxide (Na.sub.2 SiO.sub.3), Lithium Phosphor Oxide (Li.sub.3 PO.sub.4), Lithium Arsenic Oxide (Li.sub.3 AsO.sub.4), Lithium Vanadium Oxide (Li.sub.3 VO.sub.4), Lithium Magnesium Germanium Oxide (Li.sub.2 MgGeO.sub.4), Lithium Zinc Germanium Oxide (Li.sub.2 ZnGeO.sub.4), Lithium Cadmium Germanium Oxide (Li.sub.2 CdGeO.sub.4), Lithium Magnesium Silicon Oxide (Li.sub.2
Application Serial Number
Assignee at Issuance
College of Optics and Photonics
Assignee at Filing
Nonprovisional Application Record
Chai, Bruce, "Modified Wurtzite Structure Oxide Compounds as Substrates for III-V Nitride Compound Semiconductor Epitaxial Growth" (1997). UCF Patents. 390.