Abstract

An apparatus and method is disclosed for forming a nano structure on a substrate with nano particles. The nano particles are deposited through a nano size pore onto the substrate. A laser beam is directed through a concentrator to focus a nano size laser beam onto the deposited nano particles on the substrate. The apparatus and method is suitable for fabricating patterned conductors, semiconductors and insulators on semiconductor wafers of a nano scale line width by direct nanoscale deposition of materials.

Document Type

Patent

Patent Number

US 7,419,887 B1

Application Serial Number

11/189,266

Issue Date

9-2-2008

Current Assignee

Joint Assignment w/UCFRF: FRIJOUF, ROBERT F.

Assignee at Issuance

UCFRF

College

College of Optics and Photonics

Department

CREOL

Allowance Date

4-8-2008

Filing Date

7-26-2005

Assignee at Filing

UCFRF

Filing Type

Nonprovisional Application Record

Donated

no

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