An apparatus and method is disclosed for forming a nano structure on a substrate with nano particles. The nano particles are deposited through a nano size pore onto the substrate. A laser beam is directed through a concentrator to focus a nano size laser beam onto the deposited nano particles on the substrate. The apparatus and method is suitable for fabricating patterned conductors, semiconductors and insulators on semiconductor wafers of a nano scale line width by direct nanoscale deposition of materials.
US 7,419,887 B1
Application Serial Number
Joint Assignment w/UCFRF: FRIJOUF, ROBERT F.
Assignee at Issuance
College of Optics and Photonics
Assignee at Filing
Nonprovisional Application Record
Kar, Aravinda and Quick, Nathaniel, "Laser Assisted Nano Deposition" (2008). UCF Patents. 726.