Abstract
A laser-plasma EUV radiation source that generates larger liquid droplets for the plasma target material. The EUV source forces a liquid, preferably Xenon, through a nozzle, instead of forcing a gas through the nozzle. The geometry of the nozzle and the pressure of the liquid through the nozzle atomizes the liquid to form a dense spray of droplets. Because the droplets are formed from a liquid, they are larger in size, and are more conducive to generating EUV radiation. A condenser is used to convert gaseous Xenon to the liquid prior to being forced through the nozzle.
Document Type
Patent
Patent Number
US 6,324,256 B1
Application Serial Number
09/644,589
Issue Date
11-27-2001
Current Assignee
Agency: University of Central Florida Foundation, Inc.
Assignee at Issuance
Agency: TRW Inc.
Allowance Date
7-30-2001
Filing Date
8-23-2000
Assignee at Filing
Agency: TRW Inc.
Filing Type
Nonprovisional Application Record
Donated
yes
Recommended Citation
McGregor, Roy; Orsini, Rocco; and Petach, Michael, "Liquid Sprays As the Target for A Laser-Plasma EUV Light Source" (2001). UCF Patents. 732.
https://stars.library.ucf.edu/patents/732