Abstract

Methods and systems of creating a photo-mask to form continuous relied micro-structures in photo-active material. This technology uses a basic amplitude mask or electron-beam to create a binary phase grating with pi-phase depth on a transparent reticle coated with photo-active material. The reticle is then used as a phase mask for the fabrication of analog micro-elements. The mask is used in an image reduction machine such as an optical stepper. The period and duty cycle of the phase gratings can be varied to create the proper analog intensity for the desired micro-profile on the photo-active material. The design, analysis, and fabrication procedure of this invention for prisms and positive micro-lenses has been demonstrated.

Document Type

Patent

Patent Number

US 7,585,596 B1

Application Serial Number

10/961,928

Issue Date

9-8-2009

Current Assignee

University Inventor(s): Berkeley Solar Group

Assignee at Issuance

University Inventor(s): Berkeley Solar Group

College

College of Optics and Photonics

Department

CREOL

Allowance Date

5-1-2009

Filing Date

10-8-2004

Assignee at Filing

UCFRF

Filing Type

Nonprovisional Application Record

Donated

no

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