Abstract

This invention relates to Lithium Plasma discharge sources, and in particular to methods of making and producing pulsed and continuous discharge sources for plasma soft-x-ray or EUV projection lithography. Specifically, novel configurations, metal and ceramic material combinations and efficient wavelengths over and including 11.4 nm are disclosed for EUV lithium plasma discharge lamps.

Document Type

Patent

Patent Number

US 5,963,616

Application Serial Number

08/815,283

Issue Date

10-5-1999

Current Assignee

Agency: Extreme Ultraviolet (EUV), LLC

Assignee at Issuance

UCFRF

College

College of Optics and Photonics

Department

CREOL

Allowance Date

6-7-1999

Filing Date

3-11-1997

Assignee at Filing

UCFRF

Filing Type

Nonprovisional Application Record

Donated

no

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