This invention relates to Lithium Plasma discharge sources, and in particular to methods of making and producing pulsed and continuous discharge sources for plasma soft-x-ray or EUV projection lithography. Specifically, novel configurations, metal and ceramic material combinations and efficient wavelengths over and including 11.4 nm are disclosed for EUV lithium plasma discharge lamps.
Application Serial Number
Agency: Extreme Ultraviolet (EUV), LLC
Assignee at Issuance
College of Optics and Photonics
Assignee at Filing
Nonprovisional Application Record
Silfvast, William and Klosner, Marc, "Configurations, Materials and Wavelenghts for EUV Lithium Plasma Discharge Lamps" (1999). UCF Patents. 98.