Metal-Oxide Thin-Films With Reduced Residual Absorption Deposited In A Reactive Low-Voltage Ion-Plating Process With N-2 Activation
Abbreviated Journal Title
ION PLATINGS; OXIDE COATINGS; PLASMA DEPOSITION; THIN FILMS; GAS; O-2; Optics
Mechanisms have been investigated for increasing the abundance of atomic oxygen in the process environment during reactive low-voltage ion plating, a plasma-assisted evaporation process. Feeding several percent of nitrogen into the coating chamber led to enhanced oxidation and consequential reduction of residual optical absorption of ion-plated oxide films of tantala.
"Metal-Oxide Thin-Films With Reduced Residual Absorption Deposited In A Reactive Low-Voltage Ion-Plating Process With N-2 Activation" (1993). Faculty Bibliography 1990s. 2929.