Abbreviated Journal Title
J. Vac. Sci. Technol. B
OPTICS; Engineering, Electrical & Electronic; Nanoscience & Nanotechnology; Physics, Applied
Laser-produced plasmas are one of the most likely sources to be used for soft x-ray projection lithography. The characteristics of these sources are described in terms of the expected radiation efficiency within the illumination bandwidth of a lithographic system. Measurements of the plasma particulate emission are described and techniques for interdicting this emission before it reaches the illumination optics are discussed. The laser requirements are obtained for a lithographic system producing a wafer rate of 60, 6 in. wafers per hour.
Journal of Vacuum Science & Technology B
Article; Proceedings Paper
Silfvast, W. T.; Richardson, M. C.; Bender, H.; Hanzo, A.; Yanovsky, V.; Jin, F.; and Thorpe, J., "Laser-Produced Plasmas For Soft-X-Ray Projection Lithography" (1992). Faculty Bibliography 1990s. 3090.