Authors

W. T. Silfvast; M. C. Richardson; H. Bender; A. Hanzo; V. Yanovsky; F. Jin;J. Thorpe

Comments

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Abbreviated Journal Title

J. Vac. Sci. Technol. B

Keywords

OPTICS; Engineering, Electrical & Electronic; Nanoscience & Nanotechnology; Physics, Applied

Abstract

Laser-produced plasmas are one of the most likely sources to be used for soft x-ray projection lithography. The characteristics of these sources are described in terms of the expected radiation efficiency within the illumination bandwidth of a lithographic system. Measurements of the plasma particulate emission are described and techniques for interdicting this emission before it reaches the illumination optics are discussed. The laser requirements are obtained for a lithographic system producing a wafer rate of 60, 6 in. wafers per hour.

Journal Title

Journal of Vacuum Science & Technology B

Volume

10

Issue/Number

6

Publication Date

1-1-1992

Document Type

Article; Proceedings Paper

Language

English

First Page

3126

Last Page

3133

WOS Identifier

WOS:A1992KM50000154

ISSN

1071-1023

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