Emission-Spectroscopy Of Reactive Low-Voltage Ion Plating For Metal-Oxide Thin-Films
Abbreviated Journal Title
PLASMA DIAGNOSTICS; ATOMIC OXYGEN; PRESSURE; EVAPORATION; TEMPERATURE; DISCHARGES; GROWTH; Optics
Excited species in the plasma present during reactive low-voltage ion plating (RLVIP) of refractory oxide films are studied by using emission spectroscopy. We believe we have found a higher ratio of atomic to molecular oxygen then reported for earlier analyses that employed a quadrupole mass spectrometer. The application of emission spectroscopy to the RLVIP process and self-actinometry are discussed with examples of stable and unstable processes.
"Emission-Spectroscopy Of Reactive Low-Voltage Ion Plating For Metal-Oxide Thin-Films" (1993). Faculty Bibliography 1990s. 967.