Abbreviated Journal Title
EXTREME-ULTRAVIOLET EMISSION; PLASMA SOURCE; PULSE AMPLIFICATION; GENERATION; AMPLIFIERS; Optics
In this paper we report the development of nanosecond-pulsed fiber laser technology for the next generation EUV lithography sources. The demonstrated fiber laser system incorporates large core fibers and arbitrary optical waveform generation, which enables achieving optimum intensities and other critical beam characteristics on a laser-plasma target. Experiment demonstrates efficient EUV generation with conversion efficiency of up to 2.07% for in-band 13.5-nm radiation using mass-limited Sn-doped droplet targets. This result opens a new technological path towards fiber laser based high power EUV sources for high-throughput lithography steppers.
Hou, Kai-Chung; George, Simi; Mordovanakis, Aghapi G.; Takenoshita, Kazutoshi; Nees, John; Lafontaine, Bruno; Richardson, Martin; and Galvanauskas, Almantas, "High power fiber laser driver for efficient EUV lithography source with tin-doped water droplet targets" (2008). Faculty Bibliography 2000s. 457.