Abbreviated Journal Title
EXTREME-ULTRAVIOLET LITHOGRAPHY; X-RAY-EMISSION; PLASMA SOURCE; DEBRIS; Optics
A comprehensive study of the spectral and Mo-Si mirror in-band EUV emission from tin-doped droplet laser plasma targets irradiated with a single 1064 nm beam from an Yb:doped fiber laser is reported. With pre-pulse enhancement, in-band conversion efficiency of approximately 2.1% is measured for laser irradiance intensities near 8 x 10(10) W/cm(2). This is the first study to be reported that uses a high-power, high repetition rate fiber laser with the high repetition rate droplet targets where EUV generation from plasmas is measured.
George, Simi A.; Hou, Kai-Chung; Takenoshita, Kazutoshi; Galvanauskas, Almantas; and Richardson, Martin C., "13.5 nm EUV generation from tin-doped droplets using a fiber laser" (2007). Faculty Bibliography 2000s. 7155.