Abbreviated Journal Title
Appl. Phys. Lett.
There is increasing interest in extreme-ultraviolet (EUV) laser-based lamps for sub-10-nm lithography operating in the region of 6.6 nm. A collisional-radiative model is developed as a post-processor of a hydrodynamic code to investigate emission from resonance lines in Kr, Gd, and Tb ions under conditions typical for mass-limited EUV sources. The analysis reveals that maximum conversion efficiencies of Kr occur at 5 x 10(10) W/cm(2), while for Gd and Tb it was similar or equal to 0.9%/2 pi sr for laser intensities of (2-5) x 10(12) W/cm(2).
Applied Physics Letters
Masnavi, Majid; Szilagyi, John; Parchamy, Homaira; and Richardson, Martin C., "Laser-plasma source parameters for Kr, Gd, and Tb ions at 6.6 nm" (2013). Faculty Bibliography 2010s. 4381.