Droplet Laser Plasma Source For Euv Lithography
A detailed quantitative study of the water droplet laser plasma source was carried with a 100-Hz laser, that characterizes the radiation efficiency and the long-term operation. Results show that the droplet laser plasma source comes close to satisfying all the near-term needs of extreme ultraviolet lithography (EUVL).
Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest
Number of Pages
Source API URL
Schriever, G.; Richardson, M.; and Turcu, E., "Droplet Laser Plasma Source For Euv Lithography" (2000). Scopus Export 2000s. 1051.