Comparative Study Of Photo-Induced Variations Of X-Ray Diffraction And Refractive Index In Photo-Thermo-Refractive Glass
Spontaneous and photo-induced crystallization have been investigated in fluorinated silicate glass by means of X-ray diffraction and optical interferometry. This glass is a photo-sensitive material for high-efficiency phase volume hologram recording. Variations of a refractive index in this glass are controlled by UV irradiation followed by a thermal development which is photo-thermo-refractive (PTR) process. A method of discrimination of weak narrow crystalline lines from a broad diffractive pattern of a vitreous material was developed, and quantitative measurements of small concentrations of crystalline phase in glass matrix were performed. The sensitivity of the method was about 0.01 wt% of crystalline phase of NaF in a silicate glass. This crystalline phase with concentration below 0.1 wt% was detected even in a highly transparent PTR glass with a modified refractive index produced by PTR processing. A correlation between the intensity of X-ray diffraction peaks of NaF and the induced refractive index was found in equally developed PTR glass samples exposed to different dosages of UV radiation. © 2003 Elsevier B.V. All rights reserved.
Journal of Non-Crystalline Solids
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Cardinal, T.; Efimov, O. M.; and Francois-Saint-Cyr, H. G., "Comparative Study Of Photo-Induced Variations Of X-Ray Diffraction And Refractive Index In Photo-Thermo-Refractive Glass" (2003). Scopus Export 2000s. 1593.