Modeling Of Time-Dependent Dielectric Breakdown In Copper Metallization
Copper diffusion; Copper interconnect; Dielectric breakdown; E model; Time-dependent dielectric breakdown (TDDB)
Dielectric breakdown of copper interconnects has been studied. The general continuity equation on Cu+ diffusion and drift is investigated. An analytical model to predict the lifetime of time-dependent dielectric breakdown is developed. The model predictions agree well with the previously published experimental data at different electric fields and temperatures. Under an acceleration stress condition, the lifetime is proportional to electric field exponentially and consistent with the E model.
IEEE Transactions on Device and Materials Reliability
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Wu, Wen; Duan, Xiaodong; and Yuan, Jiann S., "Modeling Of Time-Dependent Dielectric Breakdown In Copper Metallization" (2003). Scopus Export 2000s. 1721.