Resonance Raman Spectroscopic Investigation Of The Mechanism And Kinetics Of The Degradation Of N, N-Hexamethylene Bishexamide, A Nylon 6, 6 Model Compound
Degradation; Kinetics; Nylon
We report a mechanistic study of the photo-oxidative degradation of N, N-hexamethylene bishexamide, a Nylon 6, 6 model compound. Resonant Raman intensities of the amide and its previously identified enal degradation product are recorded as a function of the duration of the irradiation of the amide with 266 nm laser pulses. The time dependences of the Raman intensities are consistent with those predicted by a kinetic mechanism for photo-oxidation. In particular, the rate of formation of the enal, probed by monitoring the Raman intensity of its C=O stretch peak at 1680 cm-1, agrees well with the rate of cleavage of the C-N bond in the amide, revealed by the time dependence of the intensity of the Am II (C-N stretch) vibration at 1537 cm-1. Rate constants for important steps in the degradation mechanism are obtained from the analysis. © 2001 Elsevier Science Ltd.
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Matsui, H.; Schehr, C. A.; and Schehr, C. A., "Resonance Raman Spectroscopic Investigation Of The Mechanism And Kinetics Of The Degradation Of N, N-Hexamethylene Bishexamide, A Nylon 6, 6 Model Compound" (2001). Scopus Export 2000s. 279.