Short Wavelength Sources For Microlithography
For the past decade, the evolution of microlithography tools to generate smaller features on microchips has involved using shorter ultraviolet wavelength sources and larger numerical aperture transmissive optics for imaging the complex mask patterns onto the wafers. At present, the manufacturing tools are beginning to use the 193 nm wavelength of the ArF excimer laser. In the near future, it is likely that laser sources will not be required to achieve the necessary flux needed for the high wafer throughputs of a microlithographic manufacturing system.
LEOS Summer Topical Meeting
Number of Pages
Article; Proceedings Paper
Source API URL
Silfvast, W. T., "Short Wavelength Sources For Microlithography" (2001). Scopus Export 2000s. 584.