Title
Laser Light Coupling Physics In High Repetition Rate Laser-Plasma Droplet-Target X-Ray Point Sources
Keywords
EUV lithography; Laser plasma; Water droplet target
Abstract
Laser light coupling physics in high repetition rate laser-plasma droplet-target X-ray point sources was discussed. Optical diagnostics were used to image the laser produced water droplet plasma. Application of the 1-D laser-plasma simulation code MEDUSA in conjunction with synthetic spectra code RATION indicates a strong 13 nm line emission at laser intensities of 5×1011 W/cm2.
Publication Date
12-1-2001
Publication Title
Proceedings of SPIE - The International Society for Optical Engineering
Volume
4504
Number of Pages
56-61
Document Type
Article; Proceedings Paper
Personal Identifier
scopus
DOI Link
https://doi.org/10.1117/12.448478
Copyright Status
Unknown
Socpus ID
0035764379 (Scopus)
Source API URL
https://api.elsevier.com/content/abstract/scopus_id/0035764379
STARS Citation
Keyser, Christian; Bernath, Robert; and Richardson, Martin, "Laser Light Coupling Physics In High Repetition Rate Laser-Plasma Droplet-Target X-Ray Point Sources" (2001). Scopus Export 2000s. 71.
https://stars.library.ucf.edu/scopus2000/71